![]() ![]() ![]() Anisotropic etching in contrast to isotropic etching means different etch rates in different directions in the material.Anisotropic KOH Etching of Silicon Isopropyl alcohol is added to improve selectivity As etch selectivity over SiO 2 is less than 500 at various concentrations of KOH, SiO 2 etch mask is not adequate for long etches Si 3 N 4 is an effective masking film for KOH etchant Ratio of Etch Rate of Si in KOH + H 2 O : = 400 : 1 : [111.
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